Equipment & Technology Milestones
2000 – 2025
2025
Launched India Faridabad Competence Center. Developed Model H2, a HIPIMS coater with a coating speed of cathodic arc. Developed and patented super-fast JVAD PVD technologies, for replacement of harmful chemical wet plating.
2024
Launched Tongxiang coating center dedicated for lithium battery. Developed Model R650, R2R coater using high power e-beam gun for lithium battery application. Developed Model RX300, R2R coater for coating of pure lithium.
2023
Launched Dongguan 3rd factory, world 1st technical decorative PVD coating center. Developed Model D1900, a technical decorative PVD coater.
2020
Developed UFC arc source. Developed Model H450, HiPIMS coater.
2019
Developed Model M850, duplex coater with CVC arc source. Developed Model F600, large volume filtered-arc coater. Introduced ta-C coating, Ra<0.02.
2017
Launched Yantai coating center. Developed Model P1200, MS+PECVD DLC coater for components. Developed Model P1700, world 1st PVD coater for lithium battery slot dies.
2015
Launched Xiangfan and Dongguan heat treatment and PVD centers for mold and dies. K680, plasma nitriding and PVD duplex coater. Introduced CrAlN coating.
2013
Developed Model K600, rectangular planar arc coater with AEGD technology.
2011
Launched Chengdu coating center. Korea PVD equipment factory opened.
2009
Launched Chongqing and Xi'an coating centers. Developed Model NT230, China's first HCD+arc coater.
2007
Launched Changzhou and Taizhou coating centers. Introduced TiAlSiN coating for carbide tools.
2005
Launched China's 1st PVD R&D center for cutting tools and our 2nd coating center in Jiaxing. Developed Model NT1000, fixed-magnet cathodic arc coater; introduced TiAlN coating for HOBs.
2004
Expanded Dongguan factory from Liaobu to Dalang. Developed Model NT200, world's first horizontal HCD+MS coater. Introduced China's first TiN+WCC droplet-free coating for TAPs.
2002
Patented PVD HCD Technology. Launched China's first coating factory for cutting tools in Dongguan. Developed Model NT100, high-volume HCD droplet-free TiN coater.
2000
Naxau's holding company Nano Technology Corporation is formed.
Glossary: HCD, hollow cathode discharge. MS, magnetron sputter. CVC, continuous varying magnetic field arc cathode. AEGD, arc enhance glow discharge. UFC, ultra fine arc cathode. R2R, roll to roll. JVAD, jet vapor activated deposition.
1661 Xingping 2nd Road, Pinghu Industrial Park, Zhejiang Province, China 314200