M Series PVD Coating System – Naxau PVD Coating and vacuum coating equipments

Next Generation Cathode Arc Technology

Model M is design based on Naxau SPARK® platform with patented CVC® and UFC® arc cathode technologies. SPARK® platform has a high degree of flexibility with one of industry most reliable production output. Multiple plasma technologies can be combined in one machine.

Its key features are fast cycle times, easy operation and user-friendliness at a favorable price – without compromising coating performance. Having two rotating cathodes utilizing ARC technology, the unit deposits selected Naxau Signature Coatings at a consistently high level of quality. It is the ideal choice for customers looking to enter the coating world or wanting to add a fast low-volume PVD system to their fleet of machines.

Advantages:

Improved target utilization (up to 30%)
Enhanced magnetic-field system, thus increased deposition rate
Quick cathode exchange

ETCHING TECHNOLOGIES APPLIED:

Lateral Glow Discharge
Plasma etching with argon, glow discharge
Metal ion etching (Ti, Cr)

LOAD AND CYCLE TIMES:

Max. coating volume [mm]: ø68 x H800
Max. coating height with defined coating thickness: 800mm
Max. load: 800kg
3-4 batches/day

MODULAR CAROUSEL SYSTEMS:

Dual-rotation kicker carousel or triple-rotation gearbox system

SOFTWARE:

Simple use and maintenance
Modern control system with touch screen
Data recording and real-time display of process parameters and flow
Manual and automatic process control
Remote diagnostics and maintenance

MACHINE DIMENSIONS:

Footprint [mm]: L4545 x W2200 x H2522

DOWNLOAD:

Naxau MX850 PVD Coating System-En.PDF

Model M	M450	M600
等离子区（毫米）	D680x450	D680x600
最大装载量（千克）	300	500
PVD 技术	CVC or UFC	CVC® or UFC®
蚀刻技术	SET® 或 CET®	SET® 或 CET®
可提供涂层	All coatings for Tools	All coatings for Tools
杜拉技术	可申请	可申请
阴极数	6	10
最小表面粗糙度 (Ra)	Ra0.05 (need to equip UFC®)	Ra0.05 (need to equip UFC®)
地面空间长宽高（毫米）	4600x2300x2000	4600x2300x2000

M 系列 PVD 涂层系统